A lithography mask is disclosed, comprising an alignment mark, including a first bar, a second bar crossing the first bar, and a specific pattern having different signatures with the first and second bars connecting to the second bar.
申请公布号
US7927768(B2)
申请公布日期
2011.04.19
申请号
US20080244380
申请日期
2008.10.02
申请人
VISERA TECHNOLOGIES COMPANY LIMITED
发明人
FAN CHIH-SHEN;CHEN LI-WEI;SUNG I-CHIN;WANG FA-CHENG