首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
摘要
申请公布号
JPS4412883(Y1)
申请公布日期
1969.05.29
申请号
JP19640084648U
申请日期
1964.10.29
申请人
发明人
分类号
B41F17/02;(IPC1-7):B41F17/02
主分类号
B41F17/02
代理机构
代理人
主权项
地址
您可能感兴趣的专利
DISPLAY DEVICE COMPRISING A NOTABLY HAPTIC TOUCH SURFACE AND A FLEXIBLE ELECTRICAL SHIELD
AUDIO COMPUTER SYSTEM FOR INTERACTING WITHIN A VIRTUAL REALITY ENVIRONMENT
ULTRASOUND-BASED FACIAL AND MODAL TOUCH SENSING WITH HEAD WORN DEVICE
DATA STORAGE DEVICES WITH PERFORMANCE-AWARE POWER CAPPING
Electronic Apparatus And Display Control Method
ADAPTIVE POWER CONFIGURATION FOR A MHL AND HDMI COMBINATION MULTIMEDIA DEVICE
SECURING BRACKET FOR PERIPHERAL CARDS
METHOD AND SYSTEM FOR ENABLING WIRELESS CONTROL IN TOOLS BY USE OF PORTABLE POWER SUPPLY SYSTEMS WITH EMBEDDED COMMUNICATION COMPONENTS
POWER SUPPLY DEVICE
BATTERY PACK AND METHOD OF CONTROLLING AN ELECTRIC FAN IN THE BATTERY PACK
METHOD AND SYSTEM FOR COLLECTING VIA A MES SYSTEM TIME-STAMPS OF WORKING-STATUSES
DEVICE FOR MANAGING AND CONFIGURING FIELD DEVICES IN AN AUTOMATION INSTALLATION
TIMEPIECE HOLDER ASSEMBLY
Image Forming Apparatus Having Waste Toner Collecting Function From a Plurality of Photosensitive Drums
TRANSPORT MECHANISM, DEVELOPING DEVICE, AND IMAGE FORMING APPARATUS
ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, ELECTROSTATIC CHARGE IMAGE DEVELOPER, AND TONER CARTRIDGE
LITHOGRAPHY METROLOGY METHOD FOR DETERMINING BEST FOCUS AND BEST DOSE AND LITHOGRAPHY MONITORING METHOD USING THE SAME
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING CIRCUIT PATTERN USING THE SAME
RESIST COMPOSITION AND PATTERNING PROCESS
LIGHT-EMITTING DEVICE AND RELATED LIGHT SOURCE SYSTEM