METHOD FOR CORRECTING DEFECT OF PHOTOMASK, APPARATUS FOR CORRECTING DEFECT OF PHOTOMASK, HEAD FOR CORRECTING DEFECT OF PHOTOMASK, AND APPARATUS FOR INSPECTING DEFECT OF PHOTOMASK AND METHOD FOR MANUFACTURING PHOTOMASK

摘要

PURPOSE: A method for correcting defect of photomask, an apparatus for correcting defect of photomask, a head for correcting defect of photomask, and an apparatus for inspecting defect of photomask and a method for manufacturing photomask are provided to move the foreign material by contacting a first probe and a second probe on the foreign material simultaneously. CONSTITUTION: The foreign material(2) is fixed on a photomask(1) using a first probe(3). The foreign material is adhered and maintained using a second probe(4). The first probe and the second probe touch the foreign material at the same time. The foreign material is maintained stably and firmly. The photomask comprises a light shielding part, a light-transmitting part, and a half light-transmitting part.