| 摘要 |
PURPOSE: An exposure apparatus and an exposure method are provided to precisely obtain a desired image on an exposing surface with the poor flatness without an auto-focusing function. CONSTITUTION: A substrate supporting unit(2) supports a substrate(1). A projection optical system(3) radiates light from light source to the exposing surface(1a) of the substrate. A light transmissive unit(4) includes a flat surface(4a) facing the exposing surface. The flat surface is matched with the image forming surface of the projection optical system. A driving unit(5) moves the substrate supporting unit. |
