| 摘要 |
1,182,616. Photo-sensitive materials and photo-mechanical processes. EASTMAN KODAK CO. June 8, 1967 [June 9, 1966], No.25403/67. Headings G2C and G2M. A light-sensitive material comprises (i) a transparent or translucent support (ii) a metallic layer (iii) a light-sensitive photo-resist layer and (iv) a layer of a solid water-soluble polyalkylene oxide. Specified supports are glass, polyesters, poly amides, polyalkyl methacrylates and cellulose esters whereas the metal may be chromium, chromium alloy, aluminium, silver, gold or platinum. The light-sensitive layer may be an azide in a polymeric binder such as a natural, oxidized rubber or a butadiene styrene or acrylonitrile copolymer, a naphthoquinone (1, 2) diazide sulphonic acid ester or a sensitized vinyl cinnamate polymer as in Specifications 743,455, 717,711 and 717,708 or a vinyl cinnamylidene acetate copolymer as in Specification 949, 919. The watersoluble layer is washed off before the material is imagewise exposed and developed to produce a resist and then the bared metal is etched and the remaining resist removed to leave a metal mask image which may be used as a master in subsequent photographic processes. The metal image may be positive if a quinone diazide is used, otherwise a negative image is produced. |
