发明名称 |
Multi-Rotation Epitaxial Growth Apparatus and Reactors Incorporating Same |
摘要 |
A susceptor apparatus for use in a CVD reactor includes a main platter with a central gear. The main platter has opposite first and second sides, a central recess formed in the second side, and a plurality of circumferentially spaced-apart pockets formed in the first side. The central gear is positioned within the central recess and the satellite platters are individually rotatable within the respective pockets. Each pocket has a peripheral wall with an opening in communication with the central recess. The central gear teeth extend into each of the pockets via the respective wall openings and engage a planet gear associated with each satellite platter. Rotation of the main platter about its rotational axis causes the satellite platters to rotate about their individual rotational axes. |
申请公布号 |
US2011083602(A1) |
申请公布日期 |
2011.04.14 |
申请号 |
US20100900655 |
申请日期 |
2010.10.08 |
申请人 |
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发明人 |
BERGMANN MICHAEL JOHN;EMERSON DAVID TODD;SEIBEL DAVID DEAN |
分类号 |
C30B25/12;B23Q1/64;C23C16/00;H05B6/64 |
主分类号 |
C30B25/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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