发明名称 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING
摘要 The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is (7) wherein W is selected from (Ci-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n > 2. The invention further relates to a process for using such a composition.
申请公布号 WO2011042770(A1) 申请公布日期 2011.04.14
申请号 WO2009IB07456 申请日期 2009.11.12
申请人 AZ ELECTRONIC MATERIALS USA CORP. 发明人 DAMMEL, RALPH, R.;CHAKRAPANI, SRINIVASAN;PADMANABAN, MUNIRATHNA;MIYAZAKI, SHINJI;NG, EDWARD, W.;KUDO, TAKANORI;DIOSES, ALBERTO, D.;HOULIHAN, FRANCIS, M.
分类号 G03F7/09 主分类号 G03F7/09
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