发明名称 EXPOSURE HEAD, OPTICAL UNIT FOR EXPOSURE HEAD, AND IMAGE FORMING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a technology to prevent such a mistake that one of two lens arrays for use in an exposure head is taken for the other. <P>SOLUTION: The exposure head includes: a light emitting element substrate where light emitting elements for emitting light are arranged in a first direction; a first lens array where first lenses are arrayed; a second lens array where second lenses are arrayed, the shape of the second lens being different from that of the first lens, and having a different length from the length of the first lens array in a second direction perpendicular to or nearly perpendicular to the first direction. The light emitting element substrate, the first and second lens arrays are arranged so that the light beams emitted from the light emitting elements may be imaged on an image surface after passing through the first lenses, and then, passing through the second lenses. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011073228(A) 申请公布日期 2011.04.14
申请号 JP20090226014 申请日期 2009.09.30
申请人 SEIKO EPSON CORP 发明人 SOWA KEN;IKUMA TAKESHI
分类号 B41J2/44;B41J2/45;B41J2/455;G03G15/04;H04N1/036 主分类号 B41J2/44
代理机构 代理人
主权项
地址