发明名称 APPARATUS AND METHOD FOR INSPECTING SURFACE IRREGULARITY IN RESIST FILM AND DTM MANUFACTURING LINE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus and a method for inspecting surface irregularities of a resist film easily or in real time, and to provide a DTM manufacturing line. SOLUTION: The surface of a resist film applied to the surface of a surface disk is irradiated with inspection light, regular reflection light is detected from the surface of the resist film and its two-dimensional images is output. The output displays results of the two-dimensional detection as gray scale images or hue images according to its detection level in addition to the characteristics. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011075426(A) 申请公布日期 2011.04.14
申请号 JP20090227695 申请日期 2009.09.30
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 FARIZ BIN ABDULRASHID;YAMASHITA HISAAKI;AOKI MASASHI;TAKAGO HISAMASA
分类号 G01N21/95;H01L21/027 主分类号 G01N21/95
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