发明名称 |
METHODS OF NUCLEATION CONTROL IN FILM DEPOSITION |
摘要 |
Disclosed herein are methods to achieve a significant degree of nucleation control with a chemical vapor deposition based coating approach, by controlling the chemistry of a specifically chosen under layer on a substrate such as glass and then treating this under layer on at least its surface to a specified degree to achieve targeted nucleation control in the second layer film, which is at least partially crystalline. |
申请公布号 |
WO2011044325(A2) |
申请公布日期 |
2011.04.14 |
申请号 |
WO2010US51766 |
申请日期 |
2010.10.07 |
申请人 |
STEWART ENGINEERS, INC.;SHEEL, DAVID |
发明人 |
SHEEL, DAVID |
分类号 |
C23C16/44;C23C16/02;C23C16/40;C23C16/455 |
主分类号 |
C23C16/44 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|