发明名称 CVD APPARATUS WITH ELECTRODE
摘要 <p>A manufacturing apparatus for deposition of a material on a carrier body and an electrode for use with the manufacturing apparatus are provided. The manufacturing apparatus includes a housing that defines a chamber. The housing also defines an inlet for introducing a gas into the chamber and an outlet for exhausting the gas from the chamber. At least one electrode is disposed through the housing with the electrode at least partially disposed within the chamber. The electrode has an exterior surface. A first exterior coating having an electrical conductivity of at least 7x106 Siemens/meter at room temperature is disposed on the exterior surface of the electrode. A second exterior coating different from the first exterior coating is disposed on the first exterior coating. A power supply device is coupled to the electrode.</p>
申请公布号 WO2011044441(A1) 申请公布日期 2011.04.14
申请号 WO2010US51945 申请日期 2010.10.08
申请人 HEMLOCK SEMICONDUCTOR CORPORATION;HILLABRAND, DAVID;MCCOY, KEITH 发明人 HILLABRAND, DAVID;MCCOY, KEITH
分类号 C23C16/44;C01B33/035 主分类号 C23C16/44
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