发明名称 BARRIER FILM, METHOD OF PRODUCING BARRIER FILM, AND ORGANIC PHOTOELECTRIC CONVERSION ELEMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a barrier film that can attain extremely high barrier performance, that has transparency and applicability to roll-to-roll, and that thereby possesses required adaptability to production such as bending resistance, scratch resistance, etc., as well as low cost, to provide a method of manufacturing the barrier film, and also to provide an organic photoelectric conversion element using the barrier film as a substrate. <P>SOLUTION: The barrier film has, on a base material, a barrier layer containing at least one layer of silicon atoms and oxygen atoms and an overcoat layer on top of the barrier layer. The barrier film is characterized in that the barrier layer is the layer formed by processing a layer composed of polysilazane and that the overcoat layer is provided with inorganic nanoparticles having a number average particle size of 1-200 nm. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011073417(A) 申请公布日期 2011.04.14
申请号 JP20090230263 申请日期 2009.10.02
申请人 KONICA MINOLTA HOLDINGS INC 发明人 KUDO SHINJI
分类号 B32B9/00;H01L51/42 主分类号 B32B9/00
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