摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a barrier film that can attain extremely high barrier performance, that has transparency and applicability to roll-to-roll, and that thereby possesses required adaptability to production such as bending resistance, scratch resistance, etc., as well as low cost, to provide a method of manufacturing the barrier film, and also to provide an organic photoelectric conversion element using the barrier film as a substrate. <P>SOLUTION: The barrier film has, on a base material, a barrier layer containing at least one layer of silicon atoms and oxygen atoms and an overcoat layer on top of the barrier layer. The barrier film is characterized in that the barrier layer is the layer formed by processing a layer composed of polysilazane and that the overcoat layer is provided with inorganic nanoparticles having a number average particle size of 1-200 nm. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |