| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To precisely discriminate between a normal part and a variable part from the contrast due to diffracted light with respect to an object to be inspected of a pattern having periodicity and to obtain an image to be inspected not containing a disturbance element like a moire. <P>SOLUTION: The uneveness inspection apparatus related to a mode 1 in the embodiment includes a transmitted illumination part 10, an X-Y-θstage part 20, an alignment imaging part 30, a diffracted light intensity measuring part and imaging part 40 and a processing/control part 100. The X-Y-θstage part 20 can perform the positioning operation and the feed operation of the substrate 60 to be inspected. The alignment imaging part 30 executes the positioning of the substrate 60 to be inspected and the diffracted light intensity measuring part and imaging part 40 obtains the intensity of the diffracted light from the substrate 60 to be inspected and executes obtaining of the image to be inspected. The data processing means 101 of the processing/control part 100 controls the operations of the transmitted illumination part 10, the X-Y-θstage part 20, the alignment imaging part 30 and the diffracted light intensity measuring part and imaging part 40. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
