发明名称 LIQUID JETTING HEAD, LIQUID JETTING APPARATUS, AND METHOD FOR MANUFACTURING LIQUID JETTING HEAD
摘要 PROBLEM TO BE SOLVED: To provide a liquid jetting head and a liquid jetting apparatus confirmed to have desired liquid jetting characteristics with little dispersion, and a manufacturing method that can easily inspect with high accuracy whether to have desired liquid ejecting characteristics with little dispersion in a manufacturing process. SOLUTION: The liquid jetting head includes a pressure generating chamber 12 communicating with each of a plurality of nozzle openings 21 for jetting liquid; a plurality of piezoelectric elements 300 causing a pressure change to each pressure generating chamber; and a pair of inspecting piezoelectric elements provided on both outer sides in a juxtaposed direction of piezoelectric elements of a piezoelectric element group including the plurality of piezoelectric elements. A piezoelectric layer of the inspecting piezoelectric element has a variation width of its saturation polarization being 5% or less, a variation width of remanence being 15% or less and a variation width of coercive electric field strength being 15% or less. The liquid jetting apparatus includes the liquid jetting head. The method for manufacturing the liquid jetting head includes a measuring process for measuring piezoelectric characteristics using the inspecting piezoelectric elements 300A. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011073356(A) 申请公布日期 2011.04.14
申请号 JP20090228648 申请日期 2009.09.30
申请人 SEIKO EPSON CORP 发明人 MITSUMIZO SHINICHI
分类号 B41J2/045;B41J2/055;B41J2/16 主分类号 B41J2/045
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