发明名称 TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a treatment apparatus which can be utilized with less preparation time. SOLUTION: The treatment apparatus, supplied with a treatment liquid W from a liquid storage tank 11 to a discharge head unit 110 to treat the surface of an object to be treated 50 with the treatment liquid W discharged from the discharge head unit 110, is constituted so as to have a bubble generating mechanism 13, 15 generating fine bubbles in the treatment liquid W up to the time when the treatment liquid W from the liquid storage tank 11 is discharged from the discharge head unit 110. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011072950(A) 申请公布日期 2011.04.14
申请号 JP20090228892 申请日期 2009.09.30
申请人 SHIBAURA MECHATRONICS CORP 发明人 NISHIBE YUKINOBU;ISO AKINORI;ANDO YOSHIHIRO
分类号 B08B3/02;B05B1/02;B05B1/14;B05C9/10;B08B3/10 主分类号 B08B3/02
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