发明名称 Methods for Cell Boundary Encroachment and Layouts Implementing the Same
摘要 A semiconductor device is disclosed to include a plurality of cells. Each of the cells has a respective outer cell boundary defined to circumscribe the cell in an orthogonal manner. Also, each of the cells includes circuitry for performing one or more logic functions. This circuitry includes a plurality of conductive features defined in one or more levels of the cell. One or more of the conductive features in at least one level of a given cell is an encroaching feature positioned to encroach by an encroachment distance into an exclusion zone. The exclusion zone occupies an area within the cell defined by an exclusion distance extending perpendicularly inward into the given cell from a first segment of the outer cell boundary. The exclusion distance is based on a design rule distance representing a minimum separation distance required between conductive features in adjacently placed cells on the semiconductor device.
申请公布号 US2011084312(A1) 申请公布日期 2011.04.14
申请号 US20100904134 申请日期 2010.10.13
申请人 TELA INNOVATIONS, INC. 发明人 QUANDT JONATHAN R.;BECKER SCOTT T.;GANDHI DHRUMIL
分类号 H01L27/118;G06F17/50 主分类号 H01L27/118
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