发明名称 PHASE SHIFT MASKS
摘要 A phase shift mask having a first region and a second region in a transverse direction includes a transparent layer, a phase shift pattern disposed in the first region, a transmittance control layer pattern disposed in the second region, and a shading layer pattern disposed on the transmittance control layer pattern. The phase shift pattern has a first pattern including a transparent material and a second pattern including metal. The phase shift mask may prevent haze effects through a cleaning process using an alkaline cleaning solution.
申请公布号 US2011086296(A1) 申请公布日期 2011.04.14
申请号 US20100900691 申请日期 2010.10.08
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 MOON SE-GUN;NAM DONG-SEOK;KIM HOON
分类号 G03F1/00 主分类号 G03F1/00
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