发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE: A photosensitive resin composition is provided to improve the remaining rate of the composition or the transmitting rate of ultraviolet ray in addition to the adhesive property, the insulating property, and the flatness property. CONSTITUTION: A negative photosensitive resin composition includes a resin, a urethane resin, a crosslinkable monomer, a photo-polymerizable initiator, and a solvent. The crosslinkable monomer includes at least two ethylene-based double bonds. The resin is selected from an alkaline-soluble acrylate resin, a photo polymer, and the mixture of the same. The alkaline-soluble acrylate resin is the copolymer of monomer with ethylene-based acidic group and monomer without ethylene-based acidic group.
申请公布号 KR20110038252(A) 申请公布日期 2011.04.14
申请号 KR20090095460 申请日期 2009.10.08
申请人 DONGJIN SEMICHEM CO., LTD. 发明人 YOUN, HYOC MIN;CHO, TAE PYO;WOO, CHANG MIN;SHIN, HONG DAE;YUN, JOO PYO;KIM, BYUNG UK
分类号 G03F7/027;G03F7/028 主分类号 G03F7/027
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