发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
PURPOSE: A photosensitive resin composition is provided to improve the remaining rate of the composition or the transmitting rate of ultraviolet ray in addition to the adhesive property, the insulating property, and the flatness property. CONSTITUTION: A negative photosensitive resin composition includes a resin, a urethane resin, a crosslinkable monomer, a photo-polymerizable initiator, and a solvent. The crosslinkable monomer includes at least two ethylene-based double bonds. The resin is selected from an alkaline-soluble acrylate resin, a photo polymer, and the mixture of the same. The alkaline-soluble acrylate resin is the copolymer of monomer with ethylene-based acidic group and monomer without ethylene-based acidic group. |
申请公布号 |
KR20110038252(A) |
申请公布日期 |
2011.04.14 |
申请号 |
KR20090095460 |
申请日期 |
2009.10.08 |
申请人 |
DONGJIN SEMICHEM CO., LTD. |
发明人 |
YOUN, HYOC MIN;CHO, TAE PYO;WOO, CHANG MIN;SHIN, HONG DAE;YUN, JOO PYO;KIM, BYUNG UK |
分类号 |
G03F7/027;G03F7/028 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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