| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad improving flatness in a polishing object, by maintaining stable polishing performance over a long period. <P>SOLUTION: The polishing pad 10 has a foaming sheet 2 integrally formed of a urethane resin by a wet film forming method. The foaming sheet 2 has a foaming part 2a provided with foams 3 and an unfoaming part 2b unprovided with the foams 3. The foaming part 2a is formed on the polishing surface P side, and the unfoaming part 2b is formed on the opposite surface side of the polishing surface P. A thickness of the foaming part 2a is at least 1/2 to the whole thickness. A thickness of the unfoaming part 2b is at least 1/6 to the whole thickness. The unfoaming part 2b supports the foaming part 2a. <P>COPYRIGHT: (C)2011,JPO&INPIT |
