| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a photomask, carrying out processes from drawing to heat treatment without exposing a mask blank to the air. <P>SOLUTION: A pattern image is drawn on a mask blank after a photoresist is applied thereon, in a drawing chamber 100a in a vacuum state of a drawing means 100. The mask blank with the pattern drawn is conveyed through a vacuum conveyance passage 105 maintained in a vacuum state into a heat treating chamber 110a in a vacuum state of a heat treating means 110. The photoresist with the pattern drawn, conveyed into the heat treating chamber 110a, is baked by heating. The accuracy and stability of elements and pattern roughness are improved thereby, void defects are decreased, and the resolution of an isolated space pattern is improved. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
