| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern data conversion method and a pattern data conversion device for, in the case of extracting an outline from an SEM image and converting the contour into polygon coordinate data such as GDSII (General Data Stream), reducing the number of coordinate points configuring the contour as much as possible, and at the same time, suppressing the fluctuation of a pattern shape so as to be an extent that transfer simulation is not affected. <P>SOLUTION: A pattern data conversion method is configured to input the image of the pattern data of a photo-mask or wafer, extract the outline of the input pattern data, perform deformation processing so as to more smoothly deform the outline of the pattern data, and extract coordinate data necessary for reproducing the pattern data from the outline, in which the deformation processing is performed, to generate polygon coordinate data. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
