| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer compound with a rapid alkali dissolution rate and excellent in pattern-forming properties, a photosensitive resin and a method for forming cured relief patterns. <P>SOLUTION: The polymer compound has a repeating unit expressed by general formula (1), wherein Ar<SB>1</SB>and Ar<SB>2</SB>each independently represent a 6-30C, 3-6 valent organic group which may be substituted with a substituent or substituents; Ar<SB>3</SB>represents a 6-30C, 2-6 valent organic group which may be substituted with a substituent or substituents; Y<SB>1</SB>, Y<SB>2</SB>and Y<SB>3</SB>each independently represent an acidic group protected with an acidic group or an acid-degradable group; Z represents a linking group and may form a ring with at least one of Ar<SB>1</SB>and Ar<SB>2</SB>; a and b each independently represent an integer of 1-4; c represents an integer of 0-4; n represents a repeating number and is 2-5,000. <P>COPYRIGHT: (C)2011,JPO&INPIT |
