| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the throughput in scanning exposure, for example, of a strip type photosensitive substrate transported in a roll-to-roll system. <P>SOLUTION: An exposure apparatus is provided which includes: a moving mechanism (SC) moving a substrate (SH) having photosensitivity along a scanning direction (Y direction); a stage mechanism (MS) holding a mask (M) and reciprocally moving in the scanning direction according to the movement of the substrate in the scanning direction; an illumination optical system (IL) forming an illumination region (IR) on the mask held by the stage mechanism; and a projection optical system (PL) having a first imaging system forming a first projection image, which is inverted in the scanning direction of a pattern in the illumination region, onto a first imaging region (ER1) on the substrate, and a second imaging system forming a second projection image, which is erected in the scanning direction of the pattern in the illumination region, onto a second imaging region (ER2) spaced apart from the first imaging region in the scanning direction. <P>COPYRIGHT: (C)2011,JPO&INPIT |
