SURFACE-WAVE PLASMA CVD DEVICE AND FILM-FORMING METHOD

摘要

The disclosed surface-wave plasma CVD device is provided with a waveguide tube (3) that is connected to a microwave source (2) and wherein a plurality of slot antennas (S) are formed on the magnetic field surface of the waveguide tube; a dielectric plate (4) for guiding microwaves radiated from the plurality of slot antennas (S) to a plasma processing chamber (1) and generating surface-wave plasma; an insulating shield member (1b) disposed so as to surround a film-generating processing region (R) wherein surface-wave plasma is generated; and a gas-emitting unit (52) that emits material process gas to the film-generating processing region (R).