发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
摘要 <p>A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object.</p>
申请公布号 NL2005309(A) 申请公布日期 2011.04.14
申请号 NL20102005309 申请日期 2010.09.03
申请人 ASML NETHERLANDS B.V. 发明人 BEERENS, RUUD;DONDERS, SJOERD;PASCH, ENGELBERTUS;VEN, BASTIAAN;VERMEULEN, JOHANNES
分类号 G03F7/20 主分类号 G03F7/20
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