| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inexpensive photomask with high throughput improved in the resolution of a fine hole pattern in a binary photomask, and to provide a method for manufacturing the photomask. <P>SOLUTION: The photomask includes a substrate and a light-shielding film which is formed on the substrate and has a light-shielding property against the exposure light of a wafer. The photomask has a main pattern formed thereon, the pattern enclosed by the light-shielding film and having transmissivity, and has a plurality of auxiliary patterns at the periphery of the light shielding film having the same phase with respect to the main pattern and not to be transferred to the wafer. The auxiliary patterns are disposed at a distance equal to or longer than the size of the main pattern from the main pattern. <P>COPYRIGHT: (C)2011,JPO&INPIT |
