| 摘要 |
PROBLEM TO BE SOLVED: To shorten time required for drawing while almost matching a shape of a resolving pattern with a shape of a figure contained in drawing data. SOLUTION: A sample M wherein a resist is applied to the upper surface thereof is irradiated with a charged particle beam 10a1b transmitted through a first shaping aperture 10a1l and a second shaping aperture 10a1m, thereby a pattern corresponding to the figure contained in the drawing data is plotted on the resist of the sample. In such a charged particle beam lithography apparatus 10 as above, when the figure having a shape not matching with a horizontal cross sectional shape of the charged particle beam 10a1b is contained in the drawing data, the figure contained in the drawing data is so approximately divided that the shape of the figure after dividing matches with the horizontal cross sectional shape of the charged particle beam 10a1b, and the shape of the resolving pattern formed on the resist after executing drawing and a resist process is predicted, and approximate dividing method of the adopted figure is decided. COPYRIGHT: (C)2011,JPO&INPIT
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