| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a teaching method, capable of reducing operator's work for teaching and achieving more accurate teaching. SOLUTION: When teaching work is performed, a control unit drives a stepping motor. After that, when a first sensor detects that a treatment liquid nozzle is at its home position, and when a second sensor detects that the treatment liquid nozzle is at a position corresponding to a first periphery, respectively, the amount of rotation of the stepping motor is obtained. Based on the respective obtained amounts of rotation, first teaching information and second teaching information are obtained and are registered in a motor control unit 21. COPYRIGHT: (C)2011,JPO&INPIT |
