| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist composition for a color filter, the composition excellent in pigment dispersibility as well as alkali developability. <P>SOLUTION: The negative resist composition for a color filter contains (A) a pigment dispersant, (B) a pigment, (C) an alkali-soluble resin, (D) a polyfunctional monomer, (E) a photoinitiator, and (F) a solvent, wherein the (A) pigment dispersant is a polyurethane-based grafted copolymer expressed by general formula (I), and further, is a grafted copolymer in which at least a part of tertiary amino groups of the above polyurethane grafted copolymer forms a salt with an organic acid compound. In formula (I), each of R<SP>1</SP>independently represents a 1-12C alkylene group; R<SP>2</SP>represents a polymer chain having at least one of structural units expressed by general formula (IV) or general formula (V); R<SP>3</SP>represents a divalent group selected from a group comprising an alkylene group, an arylene group and their combination; m is 2 to 200; R<SP>4</SP>represents a hydrogen atom or a methyl group; R<SP>5</SP>represents a monovalent group such as a 1-18C alkyl group and aralkyl group; l represents an integer of 1 to 5; and n' and n" each represent an integer of 5 to 200. <P>COPYRIGHT: (C)2011,JPO&INPIT |
