| 发明名称 |
LARGE AREA LINEAR ARRAY NANOIMPRINTING |
| 摘要 |
<p>Systems and methods for imprinting and aligning an imprint lithography template with a field on a substrate are described. The field of the substrate may include an elongated side, and alignment sensitivity on the elongated side may be intentionally minimized.</p> |
| 申请公布号 |
WO2011043820(A1) |
申请公布日期 |
2011.04.14 |
| 申请号 |
WO2010US02711 |
申请日期 |
2010.10.08 |
| 申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
CHOI, BYUNG-JIN;SREENIVASAN, SIDLGATA, V.;CHERALA, ANSHUMAN |
| 分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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