| 摘要 |
PURPOSE: A substrate processing apparatus is provided to improve the uniformity of a thin film deposited on a substrate by suppressing the precession of a substrate receiving unit. CONSTITUTION: A chamber has a reaction space. A substrate receiving unit(200) receives a substrate in a chamber. A rotation shaft unit(400) is extended to the substrate receiving unit and includes a rotation shaft, a shaft, a central body, and a centering body. One end of the rotation shaft is inserted and fixed to the shaft. The centering body is positioned on the central body and includes a downwardly inclined cap. A driving unit(500) applies rotation force to the rotation shaft unit.
|
