发明名称 A METAL LAYER STRUCTURE COMPRISING ELECTROLESS NI PLATING LAYER AND A FABRICATING METHOD THE SAME
摘要 <p>PURPOSE: A metal wiring structure including an electroless nickel plating layer and manufacturing method thereof are provided to minimize stress on an interface by forming an electroless nickel plating layer with a wet process. CONSTITUTION: An electroless nickel plating layer(220) is formed on an insulation layer. A surface processing layer(240) is formed on the electroless nickel plating layer. An insulation layer is an anode oxide layer, a ceramic based resin layer, an epoxy based resin layer, or a silicon based resin layer. The electroless copper plating layer is formed on the electroless nickel plating layer.</p>
申请公布号 KR20110038457(A) 申请公布日期 2011.04.14
申请号 KR20090095753 申请日期 2009.10.08
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 KIM, TAE HYUN;CHOI, SEOG MOON;KIM, TAE HOON;SHIN, SANG HYUN;LEE, YOUNG KI;PARK, SUNG KEUN
分类号 H01L21/28 主分类号 H01L21/28
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