A METAL LAYER STRUCTURE COMPRISING ELECTROLESS NI PLATING LAYER AND A FABRICATING METHOD THE SAME
摘要
<p>PURPOSE: A metal wiring structure including an electroless nickel plating layer and manufacturing method thereof are provided to minimize stress on an interface by forming an electroless nickel plating layer with a wet process. CONSTITUTION: An electroless nickel plating layer(220) is formed on an insulation layer. A surface processing layer(240) is formed on the electroless nickel plating layer. An insulation layer is an anode oxide layer, a ceramic based resin layer, an epoxy based resin layer, or a silicon based resin layer. The electroless copper plating layer is formed on the electroless nickel plating layer.</p>
申请公布号
KR20110038457(A)
申请公布日期
2011.04.14
申请号
KR20090095753
申请日期
2009.10.08
申请人
SAMSUNG ELECTRO-MECHANICS CO., LTD.
发明人
KIM, TAE HYUN;CHOI, SEOG MOON;KIM, TAE HOON;SHIN, SANG HYUN;LEE, YOUNG KI;PARK, SUNG KEUN