| 摘要 |
<p>PURPOSE: A projection optical system, an exposure apparatus, and a method for manufacturing a device are provided to respectively compensate two orthogonal directions by suppressing the generation of astigmatism. CONSTITUTION: In a projection optical system, a first flat mirror(13), a first concave mirror(14), a convex mirror(15), a second concave mirror(16), and a second flat mirror(17) are successively arranged on a light pathway from an object side to a phase side. The light pathways between the object side and the first flat mirror and between the second flat mirror and the phase side are parallel. A magnification of the projection optical system at a second direction orthogonal to a first direction is compensated in a first optical system(10). The magnification of the projection optical system at a third direction orthogonal to the first direction and the second direction is compensated at a second optical system(18). A third optical system(11) and a controlling part are further prepared.</p> |
