发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM
摘要 <p>PURPOSE: A substrate processing device, a substrate processing method, and a storage medium are provided to rapidly process a substrate by processing the substrate with priority. CONSTITUTION: A substrate carrying block includes a container arranging unit and a container transferring unit. A process block(14a,14b) includes a plurality process units(2) and a substrate transfer unit. A plurality of processing units process the substrate transferred from the substrate carrying block. A controller(5) outputs a control signal to process the substrate with priority when the substrate with the priority is transferred to the container arranging unit.</p>
申请公布号 KR20110037896(A) 申请公布日期 2011.04.13
申请号 KR20100096958 申请日期 2010.10.05
申请人 TOKYO ELECTRON LIMITED 发明人 YOSHIDA MASAHIRO;TAKUMA KOUJI
分类号 H01L21/677;B65G49/07;G06F17/00;H01L21/02 主分类号 H01L21/677
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