| 摘要 |
PURPOSE: An apparatus for processing a substrate is provided to rapidly and uniformly discharge a liquid medicine on a wafer by selecting a nozzle according to the rotation of the wafer. CONSTITUTION: In an apparatus for processing a substrate, a wafer(W) is arranged inside a bowl(10). A nozzle apparatus(20) for discharging a liquid medicine is installed outside the bowl. The nozzle apparatus includes a support member(22), a plurality of nozzles, and a plurality of bearings. A plurality of nozzles comprises a first nozzle(24a), a second nozzle(24d), and third nozzles(24b,24c) which are different. The first nozzle comprises a first virtual center line connecting the center of the wafer to the fixed shaft of the first nozzle.
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