| 摘要 |
<p>PURPOSE: A substrate processing apparatus is provided to increase the number of a substrate to be processed in parallel by forming a solution processing block in a plurality of solution processing unit. CONSTITUTION: In a substrate processing apparatus, an FOUP(Front-Opening Unified Pod)(7) receiving a wafer in a batch block(11). A transfer block(12) draws out the wafer from the FOUP to load it into a solution process unit(1). A transport block(13) transfers the wafer to a solution processing block. The solution processing block load from the solution processing block to processes it with the solution. A lifting apparatus(134) transfer the wafer between a first transfer shelf and a second transfer shelf.</p> |
