发明名称 |
IMAGE SENSOR AND FABRICATING METHOD THEREOF |
摘要 |
<p>PURPOSE: An image sensor and a fabricating method thereof are provided to stably maintain the potential of first wells by allowing a first well bias, applied to one of the first wells, to be shared with other first wells. CONSTITUTION: In an image sensor and a fabricating method thereof, a substrate(110) defines a pixel region(I) and a non-pixel region(II). . A first well(112) is formed within the substrate corresponding to the non-pixel region. A wiring structure(122) comprises a plurality of wires(124a-124c) and a plurality of an insulating layer(122). The first well and the bias well are the same conductive type.</p> |
申请公布号 |
KR20110037763(A) |
申请公布日期 |
2011.04.13 |
申请号 |
KR20090095324 |
申请日期 |
2009.10.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, YUN KI;LEE, DUCK HYUNG |
分类号 |
H01L27/146 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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