| 发明名称 |
POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD |
| 摘要 |
A positive-tone radiation-sensitive composition is used for a resist pattern-forming method that includes double exposure as a given step, and includes (B) a polymer that includes an acid-labile group and a crosslinkable group, (C) a photoacid generator, and (D) a solvent.
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| 申请公布号 |
EP2309332(A1) |
申请公布日期 |
2011.04.13 |
| 申请号 |
EP20090797918 |
申请日期 |
2009.07.14 |
| 申请人 |
JSR CORPORATION |
发明人 |
ANNO, YUUSUKE;FUJIWARA, KOUICHI;SUGIURA, MAKOTO;WAKAMATSU, GOUJI |
| 分类号 |
G03F7/40;C08F220/28;G03F7/00;G03F7/039;H01L21/027 |
主分类号 |
G03F7/40 |
| 代理机构 |
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