发明名称 ALUMINUM OXIDE PARTICLE AND POLISHING COMPOSITION CONTAINING THE SAME
摘要 <p>Aluminum oxide particles are provided that include primary particles each having a hexahedral shape and an aspect ratio of 1 to 5. The aluminum oxide particles preferably have an average primary particle size of 0.01 to 0.6 µm. The aluminum oxide particles preferably have an alpha conversion rate of 5 to 70%. Further, the aluminum oxide particles preferably have an average secondary particle size of 0.01 to 2 µm, and the value obtained by dividing the 90% particle size of the aluminum oxide particles by the 10% particle size of the aluminum oxide particles is preferably 3 or less. The aluminum oxide particles are used, for example, as abrasive grains in the applications of polishing semiconductor device substrates, hard disk substrates, or display substrates.</p>
申请公布号 KR20110038035(A) 申请公布日期 2011.04.13
申请号 KR20117000735 申请日期 2009.06.12
申请人 FUJIMI INCORPORATED 发明人 MORINAGA HITOSHI;TAHARA MUNEAKI;MATSUNAMI YASUSHI
分类号 C09K3/14;B24B37/00;C01F7/02;H01L21/304 主分类号 C09K3/14
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