发明名称 MEMBER FOR SUBSTRATE PROCESSING APPARATUS AND MEHTOD FOR MANUFACTRUING THE SAME AND SUBSTRATE PROCESSING APPARATUS
摘要 PURPOSE: A member for substrate processing apparatus and a method for manufactruing the same, and a substrate processing apparatus are provided to improve the corrosiveness and the durability by forming the anode oxide layer and the ceramic layer sequentially on the surface of the substrate processing apparatus member. CONSTITUTION: A body of the member for the substrate processing apparatus is prepared(S100). An anode oxide layer is formed on the surface of the body through the anodic oxidation process(S110). A ceramic membrane is formed on the surface of the body on which the anodized film is formed through the vacuum deposition process(S120). The body is loaded into the inner side of a vacuum deposition apparatus.
申请公布号 KR20110037282(A) 申请公布日期 2011.04.13
申请号 KR20090094660 申请日期 2009.10.06
申请人 THERMTECS CO., LTD. 发明人 KO, SUNG KEUN
分类号 H01L21/205;H01L21/302;H01L21/3065 主分类号 H01L21/205
代理机构 代理人
主权项
地址