| 摘要 |
A illumination optical apparatus can be configured to cope with both the suppression of bad influence of image formation due to a field stop and improvement of uniform distribution of an exposure amount in the case where the lightning optical apparatus is applied to exposure apparatus that uses a reflection type original plate, for instance. A lightning optical apparatus is set to light a second surface that is optically conjugate with a first surface through the reflection type original plate (M) that can be arranged at the first surface. The lightning optical apparatus is provided with a first partial field stop (21) arranged to define a first outer edge of a lightning region to be formed on the second surface in order to limit a light beam incident on the first surface, and a second partial stop (22) arranged to define a second outer edge of a lightning region in order to limit a light beam reflecting from the reflection type original plate that can be arranged on the first surface. A first distance (D1) between the first partial field stop and the first surface is set to be larger than a second distance (D2) between the second partial field stop and the first surface. |
