发明名称 WAFER SUPPORT MEMBER, METHOD FOR MANUFACTURING THE SAME AND WAFER POLISHING UNIT
摘要 PURPOSE: A wafer support member, a method for manufacturing the same and a wafer polishing unit are provided to suppress a scratch on the surface of a wafer by processing the supporting part of a wafer support unit to be round or be coated with epoxy. CONSTITUTION: In a wafer support member, a method for manufacturing the same and a wafer polishing unit, a base substrate(220) is prepared. A supporting part(210) is adhered to the adhesive material in the edge of the base substrate. The outermost of the supporting part is processed to be round. A coating layer(215) is included in the edge of the supporting part. The coating layer is arranged to be wider than the round of the supporting part.
申请公布号 KR20110037848(A) 申请公布日期 2011.04.13
申请号 KR20100091172 申请日期 2010.09.16
申请人 LG SILTRON INCORPORATED 发明人 SUNG, JAE CHEL
分类号 H01L21/304;B24B37/32;H01L21/302;H01L21/683 主分类号 H01L21/304
代理机构 代理人
主权项
地址
您可能感兴趣的专利