发明名称 ACRYLIC MONOMER, POLYMER AND CHEMICALLY AMPLICATION PHOTORESIST COMPOSITION
摘要 <p>PURPOSE: An acrylic monomer is provided to ensure little substrate dependence and excellent transparency, contrast, sensitivity, resolution, and development. CONSTITUTION: An acrylic monomer has a t-butoxycarbonyl group at the end thereof. The acrylic monomer is represented by chemical formula (I), wherein R6 is hydrogen or methyl group. A polymer is formed by polymerizing the acrylic monomer having a t-butoxycarbonyl group at the end thereof.</p>
申请公布号 KR20110037170(A) 申请公布日期 2011.04.13
申请号 KR20090094478 申请日期 2009.10.06
申请人 KOREA KUMHO PETROCHEMICAL CO., LTD. 发明人 PARK, RAN RA;KIM, JIN HO;LEE, CHANG SU;SHIN, DAE HYEON
分类号 C07C69/54;C08F220/10;C08F232/02;G03F7/004 主分类号 C07C69/54
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