发明名称 |
ACRYLIC MONOMER, POLYMER AND CHEMICALLY AMPLICATION PHOTORESIST COMPOSITION |
摘要 |
<p>PURPOSE: An acrylic monomer is provided to ensure little substrate dependence and excellent transparency, contrast, sensitivity, resolution, and development. CONSTITUTION: An acrylic monomer has a t-butoxycarbonyl group at the end thereof. The acrylic monomer is represented by chemical formula (I), wherein R6 is hydrogen or methyl group. A polymer is formed by polymerizing the acrylic monomer having a t-butoxycarbonyl group at the end thereof.</p> |
申请公布号 |
KR20110037170(A) |
申请公布日期 |
2011.04.13 |
申请号 |
KR20090094478 |
申请日期 |
2009.10.06 |
申请人 |
KOREA KUMHO PETROCHEMICAL CO., LTD. |
发明人 |
PARK, RAN RA;KIM, JIN HO;LEE, CHANG SU;SHIN, DAE HYEON |
分类号 |
C07C69/54;C08F220/10;C08F232/02;G03F7/004 |
主分类号 |
C07C69/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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