| 摘要 |
Control data for a main deflector is calculated based on position data that specifies the position of a region to be irradiated with the electron beam on the subfield, data on the number of all beam shots on the subfield, data on a time required for all the beam shots, and stage data that specifies the position of the stage. When the number of beam shots on one of the divided subfield sections reaches the obtained number of the beam shots on each of the divided subfield sections, a writing process proceed to a writing operation to be performed on another one of the divided subfield sections based on the direction of the movement of the stage.
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