发明名称 Lithographic apparatus and device manufacturing method
摘要 A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into the manifold based on the measured pressure in the manifold so as to maintain a desired pressure in the manifold.
申请公布号 US7924404(B2) 申请公布日期 2011.04.12
申请号 US20070889844 申请日期 2007.08.16
申请人 ASML NETHERLANDS B.V. 发明人 VAN DER NET ANTONIUS JOHANNUS
分类号 G03B27/42 主分类号 G03B27/42
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