发明名称 Electron beam device
摘要 A multi-biprism electron interferometer is configured so as to arrange a plurality of biprisms in an imaging optical system of a specimen. An upper electron biprism is arranged upstream of the specimen in the traveling direction of the electron beam, and an image of the electron biprism is formed on the specimen (object plane) using an imaging action of a pre-field of the objective lens. A double-biprism interference optical system is constructed of a lower electron biprism disposed downstream of the objective lens up to the first image plane of the specimen.
申请公布号 US7923685(B2) 申请公布日期 2011.04.12
申请号 US20080324937 申请日期 2008.11.28
申请人 HITACHI, LTD. 发明人 HARADA KEN;KASAI HIROTO
分类号 H01J37/04 主分类号 H01J37/04
代理机构 代理人
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