发明名称 |
Millisecond annealing (DSA) edge protection |
摘要 |
A method and apparatus for thermally processing a substrate is provided. A substrate is disposed within a processing chamber configured for thermal processing by directing electromagnetic energy toward a surface of the substrate. An energy blocker is provided to block at least a portion of the energy directed toward the substrate. The blocker prevents damage to the substrate from thermal stresses as the incident energy approaches an edge of the substrate.
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申请公布号 |
US7923280(B2) |
申请公布日期 |
2011.04.12 |
申请号 |
US20100834620 |
申请日期 |
2010.07.12 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
KOELMEL BLAKE;MCINTOSH ROBERT C.;LARMAGNAC DAVID D L;LERNER ALEXANDER N.;MAYUR ABHILASH J.;YUDOVSKY JOSEPH |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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