发明名称 Millisecond annealing (DSA) edge protection
摘要 A method and apparatus for thermally processing a substrate is provided. A substrate is disposed within a processing chamber configured for thermal processing by directing electromagnetic energy toward a surface of the substrate. An energy blocker is provided to block at least a portion of the energy directed toward the substrate. The blocker prevents damage to the substrate from thermal stresses as the incident energy approaches an edge of the substrate.
申请公布号 US7923280(B2) 申请公布日期 2011.04.12
申请号 US20100834620 申请日期 2010.07.12
申请人 APPLIED MATERIALS, INC. 发明人 KOELMEL BLAKE;MCINTOSH ROBERT C.;LARMAGNAC DAVID D L;LERNER ALEXANDER N.;MAYUR ABHILASH J.;YUDOVSKY JOSEPH
分类号 H01L21/00 主分类号 H01L21/00
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