| 发明名称 |
Semiconductor cleaning using superacids |
| 摘要 |
A method of cleaning a substrate includes contacting a surface of a semiconductor substrate with a composition comprising a superacid. The semiconductor substrate may be a wafer.
|
| 申请公布号 |
US7923424(B2) |
申请公布日期 |
2011.04.12 |
| 申请号 |
US20060350758 |
申请日期 |
2006.02.10 |
| 申请人 |
ADVANCED PROCESS TECHNOLOGIES, LLC |
发明人 |
SMALL ROBERT J. |
| 分类号 |
C11D7/08;B08B3/08 |
主分类号 |
C11D7/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
