PHOTOMASK BLANK, PHOTOMASK, AND PATTERN TRANSFER METHOD USING PHOTOMASK

摘要

A low reflective photomask blank suitable for shortened exposure wavelengths is disclosed. A photomask blank ( 1 ) having a single-layer or multilayer light-shielding film ( 3 ) arranged on a translucent substrate ( 2 ) and mainly containing a metal is characterized by comprising an antireflective film ( 6 ), which at least contains silicon and oxygen and/or nitrogen, on the light-shielding film ( 3 ).