| 摘要 |
<p>In a method for treating substrates (13) for silicon solar cells, the substrates are cleaned with deionized water (18) following multiple etching processes. The substrates (13) are then dried and heated in drying stations (22, 25), whereupon the heated substrates (13) are oxidized in an oxidation station (30) by means of an oxidizing gas having a percentage of ozone.</p> |
